等离子处理时TiN-MoSx/Ti涂层中S大量刻蚀的XPS分析

XPS Investigation of Largely Etching of S from the TiN-MoSx/Ti Composite Coating Under Plasma Treatments

  • 摘要: 采用XPS对TiN-MoSx/Ti复合膜表面S被Ar^ 大量刻蚀后化学组成及摩擦学性能的变化机理进行了研究。长时间离子轰击后复合膜表层的化学计量值x从最初的2.03降至1.25,Mo3d5/2的结合能从231.73eV相应减小到231.07eV。刻蚀5min后的涂层表面为深黑色的致密结构,摩擦学性能优异;而刻蚀15min后的涂层表面为浅灰色的疏松结构,且摩擦损性能也大幅下降。

     

    Abstract: The changes of chemical components and tribological properties of TiN MoS x /Ti composite coatings caused by largely ion etching S from its surface are studied by XPS. After long time ion etching, the surface Mo/S ratio of the composite coatings decreases from 2 03 to 1 25 with a concomitant reduction in the Mo 3d 5/2 binding energy from 231 73 eV to 231 07 eV. After 5 minutes ion etching, the surface of coatings presents a deep black colored compact structure with excellent tribological properties; but after 15 minutes ion etching, the surface of the coating presents a french grey colored loose structure with greatly decreased tribological properties.

     

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